Complementary masks and method of fabrication of same,...

Details Complementary masks and method of fabrication of same,... Complementary masks and method of fabrication of same,...

2006-02-06

2008-12-09

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000, C430S296000, C430S942000

Reexamination Certificate

active

07462428

ABSTRACT:
A complementary mask has a plurality of pattern forming regions34a,34having arranged on them complementary patterns26, 28obtained by dividing first circuit patterns into complementary patterns26, 28complementary with each other and formed by openings. The complementary patterns26, 28are arranged in the pattern forming regions34a,34bso that pattern densities of the pattern forming regions34a,34bbecome substantially the same.

REFERENCES:
patent: 4169230 (1979-09-01), Bohlen et al.
patent: 4591540 (1986-05-01), Bohlen et al.
patent: 5831272 (1998-11-01), Utsumi
patent: 5874198 (1999-02-01), Okino
patent: 6998201 (2006-02-01), Koike
patent: 2001/0028984 (2001-10-01), Yamashita et al.
patent: 54-41076 (1979-03-01), None
patent: 59-222840 (1984-12-01), None
patent: 61-283121 (1986-12-01), None
patent: 05-160012 (1993-06-01), None
patent: 09-129541 (1997-05-01), None
patent: 11-87209 (1999-03-01), None
patent: 11-135423 (1999-05-01), None
patent: 2001-274072 (2001-05-01), None

Affiliated with

Also associated with

Rating

Complementary masks and method of fabrication of same,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Complementary masks and method of fabrication of same,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Complementary masks and method of fabrication of same,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4032107