Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-07-24
2007-07-24
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S030000
Reexamination Certificate
active
10885822
ABSTRACT:
A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.
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Kohichi Nakayama et al.; Complementary Splitting with Stress Emulation for Stencil Masks; Conference: Photomask and Next-Generation Lithography Mask Technology X; Yokohama, Japan; Proceedings of the SPIE, vol. 5130, No. 1, Apr. 16, 2003, pp. 979-989.
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European Search Report dated Apr. 7, 2006.
Omori Shinji
Watanabe Yoko
Rosasco S.
Sonnenschein Nath & Rosenthal LLP
Sony Corporation
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