Complementary division condition determining method and...

Details Complementary division condition determining method and... Complementary division condition determining method and...

2006-03-07

2006-03-07

Nghiem, Michael (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Mechanical measurement system

Reexamination Certificate

active

07010434

ABSTRACT:
A complementary division condition determining method and program and a complementary division method able to propose the optimum complementary division conditions for suppressing pattern displacement and mask destruction, wherein an internal stress of a mask is determined based on a displacement of a peripheral mark in a case when forming an opening in the mask and this value is used for first analysis (step ST12), pattern displacement and stress concentration occurring due to openings of split patterns are analyzed based on a first analysis model in a first analysis (step ST13), and a displacement due to external force of the membrane between the split patterns is analyzed in a second analysis (step ST14).

REFERENCES:
patent: 6780659 (2004-08-01), Ashida
patent: 2002-260983 (2002-09-01), None
patent: 2002-260992 (2002-09-01), None
patent: 2003-353102 (2002-12-01), None
patent: 2003-031471 (2003-01-01), None
patent: 2003-045786 (2003-02-01), None

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