Compensation for errors in off-axis interferometric...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

10980706

ABSTRACT:
In general, in a first aspect, the invention features a method for determining the location of an alignment mark on a stage, which includes directing a measurement beam along a path between an interferometer and a mirror, wherein at least the interferometer or the mirror is mounted on the stage, combining the measurement beam with another beam to produce an output beam comprising information about the location of the stage, measuring from the output beam a location, x1, of the stage along a first measurement axis, measuring a location, x2, of the stage along a second measurement axis substantially parallel to the first measurement axis, calculating a correction term, ψ3, from predetermined information characterizing surface variations of the mirror for different spatial frequencies, wherein contributions to the correction term from different spatial frequencies are weighted differently, and determining a location of the alignment mark along a third axis parallel to the first measurement axis based on x1, x2, and the correction term.

REFERENCES:
patent: 4606638 (1986-08-01), Sommargren
patent: 4711573 (1987-12-01), Wijntjes et al.
patent: 4714339 (1987-12-01), Lau et al.
patent: 4790651 (1988-12-01), Brown et al.
patent: 4802765 (1989-02-01), Young et al.
patent: 4859066 (1989-08-01), Sommargren
patent: 4881816 (1989-11-01), Zanoni
patent: 5064289 (1991-11-01), Bockman
patent: 5114234 (1992-05-01), Otsuka et al.
patent: 5151749 (1992-09-01), Tanimoto et al.
patent: 5187543 (1993-02-01), Ebert
patent: 5331400 (1994-07-01), Wilkening et al.
patent: 5363196 (1994-11-01), Cameron
patent: 5408318 (1995-04-01), Slater
patent: 5663793 (1997-09-01), de Groot
patent: 5663893 (1997-09-01), Wampler et al.
patent: 5724136 (1998-03-01), Zanoni
patent: 5757160 (1998-05-01), Kreuzer
patent: 5764361 (1998-06-01), Kato et al.
patent: 5781277 (1998-07-01), Iwamoto
patent: 5790253 (1998-08-01), Kamiya
patent: 5801832 (1998-09-01), Van Den Brink
patent: 6008902 (1999-12-01), Rinn
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 6040096 (2000-03-01), Kakizaki et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6134007 (2000-10-01), Naraki et al.
patent: 6137574 (2000-10-01), Hill
patent: 6159644 (2000-12-01), Satoh et al.
patent: 6160619 (2000-12-01), Magome
patent: 6181420 (2001-01-01), Badami et al.
patent: 6246481 (2001-06-01), Hill
patent: 6252668 (2001-06-01), Hill
patent: 6271922 (2001-08-01), Bulow
patent: 6271923 (2001-08-01), Hill
patent: 6285457 (2001-09-01), Ukaji
patent: 6304318 (2001-10-01), Matsumoto
patent: 6304382 (2001-10-01), Simon
patent: 6313918 (2001-11-01), Hill
patent: 6330105 (2001-12-01), Rozelle et al.
patent: 6384899 (2002-05-01), den Boef
patent: 6541759 (2003-04-01), Hill
patent: 6650419 (2003-11-01), Hill
patent: 6700665 (2004-03-01), Hill
patent: 6710884 (2004-03-01), Hill
patent: 6727992 (2004-04-01), Hill
patent: 6738143 (2004-05-01), Chu
patent: 6747744 (2004-06-01), Hill
patent: 6757066 (2004-06-01), Hill
patent: 6762845 (2004-07-01), Hill
patent: 6791693 (2004-09-01), Hill
patent: 6795197 (2004-09-01), Hill
patent: 6806961 (2004-10-01), Hill
patent: 6806962 (2004-10-01), Hill
patent: 6819434 (2004-11-01), Hill
patent: 6836335 (2004-12-01), Hill
patent: 6839141 (2005-01-01), Hill
patent: 6867867 (2005-03-01), Hill
patent: 6882430 (2005-04-01), Hill
patent: 6891624 (2005-05-01), Hill
patent: 6906784 (2005-06-01), Hill
patent: 6912054 (2005-06-01), Hill
patent: 2001/0035959 (2001-11-01), Hill
patent: 2002/0048026 (2002-04-01), Isshiki et al.
patent: 2002/0089671 (2002-07-01), Hill
patent: 2003/0090675 (2003-05-01), Fujiwara
patent: 2004/0046965 (2004-03-01), Hill
patent: 2004/0189998 (2004-09-01), Hill
patent: 2005/0030549 (2005-02-01), Hill
patent: 2005/0134862 (2005-06-01), Hill
patent: 2005/0151951 (2005-07-01), Hill
patent: 7-351078 (1995-12-01), None
patent: 8-117083 (1996-04-01), None
patent: 8-117083 (1997-10-01), None
patent: 7-351078 (1997-11-01), None
patent: 10-260009 (1998-09-01), None
patent: WO 01/90686 (2001-11-01), None
Bennett, S.J. . “A Double-Passed Michelson Interferometer.” Optics Communications, 4:6, pp. 428-430, 1972.
Wu et al. “Analytical modeling of the periodic nonlinearity in heterodyne interferometry.” Applied Optics, 37:28, pp. 6696-6700, 1998.
Hines et al. Sub-Nonometer Laser Metrology—Some Techniques and Models. ESO Conference on High-Resolution Imaging by Interferometry II, pp. 1195-1204, 1991.
Bobroff, Norman. “Recent advances in displacement measuring interferometry.” Meas. Sci. Technol. 4, pp. 907-926, 1993.
Oka et al. “Polarization heterodyne interferometry using another local oscillator beam.” Optics Communications, 92, pp. 1-5, 1992.
Badami et al. “Investigation of NonLinearity in High Accuracy Heterodyne Laser Interferometry.” American Society for Precision Engineering, 1997 Proceedings, 16, pp. 153-156, 1997.
Bobroff, Norman. “Residual errors in laser interferometry from air turbulence and nonlinearity.” Applied Optics, 26:13, pp. 2676-2686, 1987.
Badami, V.G. et al. “Investigation of nonlinearity in high accuracy heterodyne laser interferometry.” 1997 American Society for Precision Engineering Proceedings, 16, pp. 153-156.
Bennett, S.J. “A double-passed michelson interferometer.” Optics Communications, 4:6, pp. 428.430, 1972.
Bobroff, N. “Recent advances in displacement measureing interferometry.” Meas. Sci. Technol, 4, pp. 907-926, 1993.
Hines et al. “Sub-nonmeter laser metrology—some techniques and models.” ESO Conference on High-Resolution Imaging by interferometry II, pp. 1195-1204, 1991.
Oka K. et al. “Polarization heterodyne interferometry using another local oscillator beam.” Optics Communication, 92, pp. 1-5, 1992.
Wu, C.M. et al. “Analytical modeling of the periodic nonlinearity in heterodyne interferometry.” Applied Optics, 37:28, pp. 6696-6700, 1998.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Compensation for errors in off-axis interferometric... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compensation for errors in off-axis interferometric..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compensation for errors in off-axis interferometric... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3898261

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.