Compensation for distortion in contact lithography

Details Compensation for distortion in contact lithography Compensation for distortion in contact lithography

2006-07-24

2009-11-03

Patel, Ramesh B (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S097000, C700S098000, C700S118000, C700S119000, C700S163000, C324S620000, C327S133000, C327S317000, C349S004000, C378S034000, C378S035000

Reexamination Certificate

active

07613538

ABSTRACT:
A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

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PCT International Search Report; International Application No. PCT/US2007/016580; Applicant Hewlett-Packard Development Company, L.P.; Form PCT/ISA/210.

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