Compensating for non-uniform boundary conditions in standard...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations

Reexamination Certificate

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Details

C716S050000, C716S051000, C716S052000, C716S053000, C716S055000, C716S139000, C430S005000, C430S030000

Reexamination Certificate

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08051390

ABSTRACT:
A method of design of a standard cell and a standard cell is disclosed. The method design comprising the steps of: identifying a non-uniformity in a boundary condition of said standard cell that would affect a characteristic of a neighbouring standard cell; introducing a further non-uniformity into said cell to mitigate the effect of said identified non-uniform boundary condition on said characteristic of said neighbouring standard cell.

REFERENCES:
patent: 6163877 (2000-12-01), Gupta
patent: 6595211 (2003-07-01), Weiler et al.
patent: 2008/0250383 (2008-10-01), Tanaka et al.

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