Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2008-10-07
2011-11-01
Doan, Nghia (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S050000, C716S051000, C716S052000, C716S053000, C716S055000, C716S139000, C430S005000, C430S030000
Reexamination Certificate
active
08051390
ABSTRACT:
A method of design of a standard cell and a standard cell is disclosed. The method design comprising the steps of: identifying a non-uniformity in a boundary condition of said standard cell that would affect a characteristic of a neighbouring standard cell; introducing a further non-uniformity into said cell to mitigate the effect of said identified non-uniform boundary condition on said characteristic of said neighbouring standard cell.
REFERENCES:
patent: 6163877 (2000-12-01), Gupta
patent: 6595211 (2003-07-01), Weiler et al.
patent: 2008/0250383 (2008-10-01), Tanaka et al.
Clark David Paul
Frederick Marlin Wayne
ARM Limited
Doan Nghia
Nixon & Vanderhye P.C.
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