Compartmentalized cell-culture device and method

Details Compartmentalized cell-culture device and method Compartmentalized cell-culture device and method

1984-10-30

1988-05-31

Tarcza, John E.

Chemistry: molecular biology and microbiology

Spore forming or isolating process

435285, 435818, C12N 500, C12M 300

Patent

active

047481242

ABSTRACT:
A closed, cell culture device constructed using a first and second sheet of gas permeable, liquid-impermeable material. A third sheet of a material selectively permeable to a class of molecules sandwiched between the first and second sheets, all of the sheets being formed such that the first and third sheets define a first closed compartment and the second and third sheets define a second closed compartment, each compartment having an access port.

REFERENCES:
patent: 3275528 (1966-09-01), Ainis
patent: 3821087 (1974-06-01), Knazek et al.
patent: 3997396 (1976-12-01), Delente
patent: 4296205 (1981-10-01), Verma
patent: 4308351 (1981-12-01), Leighton et al.
patent: 4332906 (1982-06-01), Taylor
patent: 4440853 (1984-04-01), Michaels et al.
patent: 4661455 (1987-04-01), Hubbard
Hawley, Condensed Chemical Dictionary, 1971, pp. 474 and 841.
Dexter, T. M., "Cell Interactions in Vitro", Clinics in Haematology 8, pp.453-568, (1979).
Rose, C. G., "Cytopathophysiology of Tissue Cultures Growing Under Cellophane Membranes", International Review of Experimental Pathology, Richter, G. W. E. Epstein, M.A., EDS., vol. 5, pp. 111, 115 and 160-178, (1966).
Marbrook J., "Primary Immune Response in Cultures of Spleen Cells". The Lancet, 2, 1279-1281, (1967).

Affiliated with

Also associated with

Rating

Compartmentalized cell-culture device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compartmentalized cell-culture device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compartmentalized cell-culture device and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1874170