Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-02-08
1997-06-10
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118728, 118729, 156345, 369270, 269 22, 269 34, 269 47, 269 52, 269238, C23C 1450, C23C 1600, B23Q 308
Patent
active
056372000
ABSTRACT:
Apparatus for locking a workpiece, such as a compact disc, in a vacuum chamber includes a locking mechanism, movable between a locked position and an unlocked position, and a sealed bellows assembly that is coupled to the locking mechanism. The locking mechanism is automatically actuated by the bellows assembly between the locked and unlocked positions when the pressure in the chamber is changed by a predetermined amount. The locking apparatus is preferably used for locking the compact disc to a disc holder during processing and/or handling.
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Patent Abstract of Japan, vol. 007, No. 090 (P-191), 14 Apr. 1983, (Oodeiotekunika:KK) 1 Feb. 1983 & JP,A,58 017502.
Breneman R. Bruce
McDonald Rodney G.
Nobler Technologies, Inc.
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