Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or...
Patent
1994-05-25
1996-03-19
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
430546, 430377, 430631, 241184, G03C 100, B02C 1720
Patent
active
055003311
ABSTRACT:
A method of preparing submicron particles of a material, such as a pigment useful in paints or a compound useful in imaging elements, which comprises milling the agent in the presence of milling media having a mean particle size of less than about 100 microns. In a preferred embodiment, the milling media is a polymeric resin. The method provides extremely fine particles, e.g., less than 100 nm in size, free of unacceptable contamination.
REFERENCES:
patent: 3104608 (1963-09-01), Castelll et al.
patent: 3713593 (1973-01-01), Morris et al.
patent: 4262851 (1981-04-01), Graser et al.
patent: 4404346 (1983-09-01), Pirotta et al.
patent: 4474872 (1984-10-01), Onishi et al.
patent: 4940654 (1990-07-01), Diehl et al.
patent: 4974368 (1990-12-01), Miyamoto et al.
patent: 5066335 (1991-11-01), Lane et al.
patent: 5066486 (1991-11-01), Kamen et al.
patent: 5145684 (1992-09-01), Liversidge et al.
Drukenbrod, "Smaller is Better?", Paint & Coatings Industry, Dec. 1991, p. 18.
Czekai David A.
Seaman Larry P.
Anderson Andrew J.
Bowers Jr. Charles L.
Eastman Kodak Company
Huff Mark F.
LandOfFree
Comminution with small particle milling media does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Comminution with small particle milling media, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Comminution with small particle milling media will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1958782