Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1995-11-02
1999-03-02
Beck, Shrive
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423246, 423345, 423440, 423610, 423625, 427249, 4272551, 4272552, 427223, 4272553, C23C 1640
Patent
active
058766839
ABSTRACT:
A low pressure combustion flame method for the production of nanophase powders, coatings and free-standing forms. The process involves controlled thermal decomposition of one or more metalorganic precursors in a flat-flame combustor unit in which both temperature distribution and gas phase residence time are uniform over the entire surface of the burner. It is this feature that makes the combustion flame reactor such a versatile tool for (1) high rate production of loosely agglomerated nanoparticle powders with controlled particle size and distribution, (2) uniform deposition of shape conformal nanophase coatings, and (3) net-shaped fabrication of nanocrystalline free-standing forms such as sheets, rings and drums. Applications for this new nanomaterials processing technology include electrical, thermal, optical, display, magnetic, catalytic, tribological and structural materials.
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Chen Yijia
Glumac Nicholas
Kear Bernard H.
Skandan Ganesh
Beck Shrive
Meeks Timothy
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