X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1987-10-06
1989-04-11
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 71, G01N 2320
Patent
active
048213039
ABSTRACT:
Scientific apparatus and a method are described for observing simultaneously both structural and thermodynamic properties of materials. An X-ray diffractometer and a thermal analyzer and mounted to cooperate and coact on the same sample and to complete a meaningful analysis in a very few minutes. The diffractometer is equipped with a rapid position-sensitive detector connected to a multichannel analyzer to record and display X-ray diffraction data from the sample over an angle of 20.degree. (two theta) or more. The thermal analyzer is preferably a differential scanning calorimeter. By correlating X-ray diffraction and thermal data taken simultaneously while the sample is passing through a range of temperatures and/or environments, structural changes corresponding to thermal events can be identified and elucidated.
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Fawcett Timothy G.
Harris, Jr. William C.
Knoll Frank J.
Newman Robert A.
Whiting Lawrence F.
Church Craig E.
Freeman John C.
Halldorson Burke M.
The Dow Chemical Company
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