Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1998-07-28
2000-10-03
Kim, Robert H.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
280548, 355 53, 355 55, G01B 1100, G01N 2186, G08B 2742
Patent
active
061280895
ABSTRACT:
A target for measurement of critical dimension bias on a substrate formed by a lithographic process comprises six contrasting arrays of elements on first and second layers of the substrate. Each of the arrays has a plurality of spaced parallel elements contrasting with the substrate. Ends of the contrasting elements are aligned along parallel lines forming opposite array edges, with the length of the contrasting elements comprising the array width. The array edges are measurable by microscopy without resolution of individual elements of the array. The arrays are spaced apart in the X-direction, with three on a first layer of the substrate and three on a second layer of the substrate. The first, second and third contrasting arrays of elements on the first layer of the substrate are interposed between at least two of the fourth, fifth and sixth contrasting arrays of elements on the second layer of the substrate. All of the contrasting arrays are visible such that critical dimension bias in the X-direction may be measured by reference to one edge of one of the arrays with one edge of another of the arrays without resolution of the individual array elements.
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Ausschnitt Christopher P.
Nyyssonen, deceased Diana
Swing, executor by Jeffrey
International Business Machines - Corporation
Kim Robert H.
Peterson Peter W.
Smith Zandra V.
Townsend Tiffany L.
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