Combined high speed optical profilometer and ellipsometer

Details Combined high speed optical profilometer and ellipsometer Combined high speed optical profilometer and ellipsometer

2006-09-19

2006-09-19

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

Plural test

Reexamination Certificate

active

07110097

ABSTRACT:
A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer.

REFERENCES:
patent: 5252836 (1993-10-01), Matthews et al.
patent: 5717485 (1998-02-01), Ito et al.
patent: 5969818 (1999-10-01), Johs et al.

Affiliated with

Also associated with

Rating

Combined high speed optical profilometer and ellipsometer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Combined high speed optical profilometer and ellipsometer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Combined high speed optical profilometer and ellipsometer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3599120