Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-12-04
1994-10-18
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 250288, 250423R, G01N 2726, G01N 27447, H01J 4902, H01J 2702
Patent
active
RE0347574
ABSTRACT:
A system and method for analyzing molecular constituents of a composition sample includes: forming a solution of the sample, separating the solution by capillary electrophoresis into an eluent of constituents longitudinally separated according to their relative electrophoretic mobilities, electrospraying the eluent to form a charged spray in which the molecular constituents have a temporal distribution; and detecting or collecting the separated constituents in accordance with the temporal distribution in the spray. A first high-voltage (e.g., 5-100 KVDC) is applied to the solution. The spray is charged by applying a second high voltage (e.g., .+-.2-8 KVDC) between the eluent at the capillary exit and a cathode spaced in front of the exit. A complete electrical circuit is formed by a conductor which directly contacts the eluent at the capillary exit, or by conduction through a sheath electrode discharged in an annular sheath flow about the capillary exit.
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Olivares Jose A.
Smith Richard D.
Udseth Harold R.
Battelle (Memorial Institute)
Niebling John
Starsiak Jr. John S.
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