Combined electrolytic-abrasive polishing apparatus

Details Combined electrolytic-abrasive polishing apparatus Combined electrolytic-abrasive polishing apparatus

1985-03-26

1986-09-02

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204224M, 204225, 204271, C25F 314, C25D 1712

Patent

active

046094504

ABSTRACT:
Method and apparatus for combined electrolytic-abrasive polishing: providing a tool electrode rotatable by means of a rotational drive and having a liquid-permeable visco-elastic polishing member attached to the surface of a conductive disk-like tool base; contacting the visco-elastic polishing member with a free curved surface of a workpiece, with the rotational axis of the tool electrode in tilted state relative to a plane averaging undulations on the free curved surface, to contact only peripheral portions of the visco-elastic polishing member retaining abrasive grains with the workpiece; supplying an electrolyte to polishing portions between the visco-elastic polishing member and workpiece; and conducting current for electrolysis across the visco-elastic polishing member and workpiece. The apparatus can perform the combined electrolytic-abrasive polishing automatically along free curved surface of a work by the use of an automatic two-dimensional feed mechanism.

REFERENCES:
patent: 2385198 (1945-09-01), Engle
patent: 3345281 (1967-10-01), Falls
patent: 3619401 (1971-11-01), Eisner
patent: 3706650 (1972-12-01), Eisner
patent: 3779887 (1973-12-01), Gildone
patent: 4140598 (1979-02-01), Kimoto et al.

Affiliated with

Also associated with

Rating

Combined electrolytic-abrasive polishing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Combined electrolytic-abrasive polishing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Combined electrolytic-abrasive polishing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1096047