Combined attenuated-alternating phase shifting mask structure an

Details Combined attenuated-alternating phase shifting mask structure an Combined attenuated-alternating phase shifting mask structure an

1994-11-17

1996-10-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430323, 430324, 430394, G03F 900

Patent

active

055652867

ABSTRACT:
A structure and fabrication method for a phase-shifting lithographic mask wherein an attenuated phase-shifting mesh structure (Att PSM) is combined with an alternating-element phase shifting mask (Alt PSM) to provide a mask combination consisting of phase-shifted and unshifted attenuated backgrounds in which the phase-shifted attenuated backgrounds surrounds the unshifted components and the unshifted attenuated background surrounds the phase-shifted components.

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patent: 5045417 (1991-09-01), Okamoto
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patent: 5384219 (1995-01-01), Dao et al.
patent: 5429897 (1995-07-01), Yoshioka et al.
Marc D. Levenson et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask," I.E.E.E. Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982.

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