Combined ablation and exposure system and method

Details Combined ablation and exposure system and method Combined ablation and exposure system and method

2005-08-23

2005-08-23

Eickholt, Eugene H. (Department: 2854)

Printing

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Blanks and processes

C101S467000, C430S300000, C347S233000

Reexamination Certificate

active

06931992

ABSTRACT:
An exposure system is provided that surrounds a photopolymer on a rotating cylinder ablation system. The exposure system linearly follows the ablation source and operates to expose the ablated (masked) plate with high intensity illumination from all sides so as to continuously expose all points on the photopolymer.

REFERENCES:
patent: 5351617 (1994-10-01), Williams et al.
patent: 5540150 (1996-07-01), Lewis et al.
patent: 5760880 (1998-06-01), Fan et al.
patent: 2002/0069777 (2002-06-01), Rossini et al.
patent: 2003/0075257 (2003-04-01), Salvestro
patent: 2003/0211419 (2003-11-01), Fan
patent: 2004/0041990 (2004-03-01), Wolber

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