Combination of ellipsometry and optical stress generation...

Optics: measuring and testing – Material strain analysis – With polarized light

Reexamination Certificate

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C356S369000

Reexamination Certificate

active

07903238

ABSTRACT:
A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

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A. Moritani, Y. Okada, and J. Nakai, “Use of an ADP four-crystal electrooptic modulator in ellipsometry”, Applied Optics, vol. 22, (1983), pp. 1329-1337.
A. Moritanti, Y. Okada, H. Kubo, and J. Nakai, “High-speed retardation modulation ellipsometer”, Applied Optics, vol. 22, (1983), pp. 2429-2436.
Robert F. Enscoe and Richard J. Kocka, “Systems and Applications Demands for Wider-Band Beam Modulation Challenge System Designers”, copyright 1981-2005 by Conoptics Inc.

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