Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2011-02-22
2011-02-22
Deo, Duy-Vu N (Department: 1713)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S717000, C438S718000
Reexamination Certificate
active
07892979
ABSTRACT:
A method of manufacturing a dot pattern includes the steps of preparing a structured material composed of a plurality of columnar members containing a first component and a region containing a second component different from the first component surrounding the columnar members, with the structured material being formed by depositing the first component and the second component on a substrate, and removing the columnar members from the structured material to form a porous material having a columnar hole. In addition, a material is introduced into the columnar hole portions of the porous material to form a dot pattern, and the porous material is removed.
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Den Tohru
Fukutani Kazuhiko
Kuriyama Akira
Miyata Hirokatsu
Ogawa Miki
Canon Kabushiki Kaisha
Deo Duy-Vu N
Fitzpatrick ,Cella, Harper & Scinto
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