Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1984-03-16
1985-12-10
Brown, J. Travis
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430379, 430407, 430551, 430578, 430614, G03C 146
Patent
active
045580006
ABSTRACT:
A color reversal light-sensitive material comprising a support having coated thereon at least a pair of silver halide emulsion layers having mutually different color sensitivities and consisting of an emulsion having a high silver/coupler ratio and an emulsion having a low silver/coupler ratio, the former ratio being greater by a factor of at least 5 than the latter ratio, and the latter emulsion being incorporated with a compound containing recurring units represented by the following General Formula (I): ##STR1## the substituents being defined within the specification. By including the compound of the general formula (I) within the particular emulsion layer which is highly susceptible to changes in sensitivity and maximum density, it is possible to prevent deterioration in color balance which has been found to be due to variation in the concentration of potassium bromide.
REFERENCES:
patent: 3520689 (1970-07-01), Nagae et al.
patent: 3622339 (1971-11-01), Nishio et al.
patent: 3728121 (1973-04-01), Zorn et al.
patent: 4276372 (1981-06-01), Wernicke et al.
Deguchi Naoyasu
Hayashi Yasuhiro
Imai Kiyoshi
Yamagami Hiroyuki
Brown J. Travis
Fuji Photo Film Co. , Ltd.
LandOfFree
Color reversal light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Color reversal light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Color reversal light-sensitive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-58755