Color photographic light-sensitive material offering excellent h

Details Color photographic light-sensitive material offering excellent h Color photographic light-sensitive material offering excellent h

1990-12-18

1993-01-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Two or more radiation-sensitive layers containing other than...

430504, 430505, 430574, 430583, 430588, G03C 146

Patent

active

051806576

ABSTRACT:
A silver halide color photographic light-sensitive material which offers high chroma and excellent hue reproduction comprises a support having thereon a blue-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a red-sensitive silver halide emulsion layer, wherein the maximum sensitivity wavelength .lambda..sub.B of a spectral sensitivity distribution of said blue-sensitive silver halide emulsion layer is in the range of 410 nm.ltoreq..lambda..sub.B .ltoreq.470 nm; and the sensitivity of said blue-sensitive silver halide emulsion layer at 480 nm is not more than half of the sensitivity at said wavelength .lambda..sub.B. Preferably, the maximum sensitivity wavelength .lambda..sub.G of said green-sensitive layer is in the range of 530 nm.ltoreq..lambda..sub.G .ltoreq.560 nm and the sensitivity of said green-sensitive layer at the wavelength of 500 nm is not less than one-fourth of the sensitivity at SG.sub.max ; the maximum sensitivity wavelength .lambda..sub.R of said red-sensitive layer is in the range of 595 nm.ltoreq..lambda..sub.R .ltoreq.625 nm and the maximum sensitivity of red-sensitive layer in the range of 400 nm to 480 nm is not less than 1.5% of the sensitivity of blue-sensitive layer at .lambda..sub.B.

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Vervoort and Stappaerts, "A New Gevacolor Negative Film Type 682", The BKSTS Journal (Apr. 1980), pp. 148-153.
Hara, Kishimoto and Yamaryo, "Two New Types of Fujicolor Films: A Negative with Improved Characteristic and a Hot-Process Positive", SMPTE Journal, vol. 88, Jul. 1979, pp. 469-473.

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