Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1997-04-30
1999-08-03
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430553, 430955, 430957, G03C 7305, G03C 732
Patent
active
059324074
ABSTRACT:
A color photographic element comprising a film support and a first radiation-sensitive layer further includes an oxidized developer-scavenging naphtholic coupler that is substantially immobilized in the element but forms a dye that can be removed from the material during photographic processing. The naphtholic coupler, which comprises a dye-forming moiety and a ballasted, substantially photographically inert coupling-off moiety, has the structure ##STR1## where R.sup.1 and R.sup.2 each independently represents hydrogen, an alkyl group, an alkoxyalkyl group, or a hydroxyalkyl group, R.sup.1 and R.sup.2 together containing a total of up to 4 carbon atoms; R.sup.3 represents hydrogen, halo, or an alkoxy, an alkylcarbonamido, an alkylsulfonamido, a carbamoyl, or a sulfamoyl group containing up to 4 carbon atoms; R.sup.1, R.sup.2, and R.sup.3 of the dye-forming moiety are each devoid of alkali-solubilizing groups and together allow substantially complete removal during photographic processing of the dye formed by the naphtholic coupler; R.sup.4, R.sup.5 and R.sup.6 represent substituent groups that together comprise ballast sufficient to substantially immobilize the coupler in the color photographic element and together render the coupling-off moiety substantially photographically inert, at least one of R.sup.4, R.sup.5 and R.sup.6 comprises at least 8 carbon atoms; and R.sup.5 is selected from a group of substituent groups effective to substantially prevent formation of dye and/or stain by reaction of the coupling-off moiety with oxidized developer.
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Research Disclosure 37038, Feb. 1995.
Begley William J.
Singer Stephen P.
Sowinski Allan F.
Eastman Kodak Company
Huff Mark F.
Roberts Sarah Meeks
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