Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only
Reexamination Certificate
2005-05-24
2005-05-24
Niebling, John F. (Department: 2812)
Liquid crystal cells, elements and systems
Particular structure
Having significant detail of cell structure only
C349S146000, C349S113000
Reexamination Certificate
active
06897927
ABSTRACT:
In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).
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Kim, C. W. et al., “A Novel Four-Mask-Count Process architecture for TFT-LCDs”,SID 00 Digest, pp. 1006-1009.
Hashimoto Yoshiaki
Kido Syuusaku
Sakamoto Michiaki
Tanaka Hiroaki
Watanabe Takahiko
NEC LCD Technologies Ltd.
Niebling John F.
Stevenson Andre′ C.
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