Color filters, including taking out electrodes or post-ito layer

Details Color filters, including taking out electrodes or post-ito layer Color filters, including taking out electrodes or post-ito layer

1992-04-27

1995-05-30

Sikes, William L.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359 68, 359 88, G02F 11335, G02F 11343

Patent

active

054207088

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FILED

The present invention relates to a color filter and a process for producing a color filter. The present invention further relates to a color liquid crystal panel comprising the color filter and a method of driving the color liquid crystal panel.


BACKGROUND ART

Color filters prepared by laminating a coloring matter layer on an insulating substrate are used in a color liquid crystal panel for a display of a liquid crystal TV, a personal computer or the like. Heretofore, a color filter having a structure as indicated in FIG. 16, has been known. In the color filter as indicated in FIG. 16, a transparent ITO (Id-Sn oxide) electrode (b) is formed on an insulating glass substrate (a). On the ITO electrode, coloring matter layers (c) for primary three colors, i.e., R (red), G (green) and B (blue), are formed, and a black matrix (light-shielding film) (d) is formed between each of the coloring matter layers (C). Such black matrix is used to avoid lowering of contrast and color purity due to leaked light. In addition, in FIG. 16, (e) denotes a top coating layer and (f) denotes a post-ITO layer.
In general, the coloring matter layers of the color filters are formed by known methods. Such known methods include: a printing method which comprises printing inks for three primary colors (RGB) on a glass substrate with use of a printing equipment; a dispersion method which comprises applying a pigment dispersed in a UV-curable resist on a glass substrate, and then forming coloring matter layers for red, green and blue by repeating mask exposure and thermal curing, three times, by way of a photo-lithography method; a dyeing method which comprises forming a resist layer as a dye preventing layer on a gelatin layer, and dyeing the gelatin layer to form coloring matter layers for RGB; an electro-deposition method which comprises forming a dispersion of a pigment and an electrodepositing polymer, and subjecting the dispersion to electro-deposition treatment utilizing an electrode formed on the substrate; and a micellar disruption method which comprises forming a dispersion of a pigment and a surfactant, and subjecting the dispersion to electrolytic treatment utilizing an electrode formed on the substrate.
The coloring matter layers of the color filter as shown in FIG. 16 are usually formed by way of an electrical treatment such as an electro-deposition method or a micellar disruption method (Refer to Japanese Patent Application Unexamined Publication No. 63-243298).
Carbon type photo-resist materials are widely used in the other color filter production methods such as a printing method, dispersion method and dyeing method. However, if such carbon type photo-resist materials are used in the electrical treatment such as a micellar disruption method or an electro-deposition method, there will be several problems due to their conductivity. More specifically, if such a conductive resist material is used, when a black matrix is first formed and then coloring matter layers are formed, or when electrodes for forming coloring matter layers are used to drive liquid crystals, the vicinal transparent electrodes will be electrically connected through the black matrix. Thus, the operations cannot be properly conducted.
Accordingly, in a micellar disruption method or an electro-deposition method, as an insulating resist material used for forming a black matrix, the insulating material preferably having a surface resistance of not less than 10.sup.7 .OMEGA./cm.sup.2 is used.
As insulating resist material used for forming a black matrix, organic pigment type materials are known.
However, when a black matrix is prepared from an organic pigment type insulating resist material, there is a problem that the light-shielding rate is decreased. This is because a black matrix is formed by way of a photo-lithography method using a blend of three kinds of a resist material each containing a pigment for red, green or blue.
It is said that as for the light-shielding rate, for example, in the case of a TFT panel, optical density (OD) shou

REFERENCES:
patent: 4560241 (1985-12-01), Stolov et al.
patent: 4639088 (1987-01-01), Suginoya et al.
patent: 4779957 (1988-10-01), Suginoya et al.
patent: 4935757 (1990-06-01), Hatano et al.
patent: 5045418 (1991-09-01), Fukuyoshi
patent: 5206750 (1993-04-01), Aizawa et al.

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