Color filters and their preparation

Optical: systems and elements – Light interference – Produced by coating or lamina

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359588, 359586, 359890, G02B 528, G02B 110, G02B 522

Patent

active

055025951

ABSTRACT:
A color filter comprising a transparent substrate and two or more multilayer films of amorphous silicon materials deposited on said substrate, each film being different, each layer of said two or more multi-layer films having a thickness less than the wavelength of the visible light and at least three layers of said two or more multi-layer films of amorphous silicon materials in an alternate arrangement wherein the amorphous silicon materials are selected from a-SiOx and a-SiNx is described. A method of preparing the color filter comprising depositing on the substrate by PECVD method two or more multilayer films is also described. The color filters prepared by PECVD method have a more compact texture and a better environmental resistant. The PECVD method for the preparation of the filters is more efficient than conventional methods.

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patent: 4887886 (1989-08-01), Shimizee et al.
Rung-Ywan Tsai et al., "Optical Characterization of Amorphous SiNx:H Films Prepared by Plasma.sub.-- Enhanced CVD", Mat. Res. Soc. Symp. Proc. vol. 281. pp. 803-808.
S. Nitta et al., "Anomalous Reflectance in Random Amorphous Multilayers a--Si:H/Si.sub.1l -.sub.x N.sub.x " Journal of Non-Crystalline Solids 137 & 138 (1991) pp. 1095-1098.
M. Beaudion et al., "Blue.sub.-- Shift of the Optical Bandgap of a--SiH:/a--SiN.sub.x :H Multilayer Structures" Journal of Non-Crystalline Solids 137 & 138 (1991) pp. 1099-1102.
Rung-Ywan Tsai et al., "Amorphous Silicon and Amorphous Silicon Nitride Films Prepared By Plasma-Enhanced CVD Process as Coating Materials", Applied Optics, vol. 32, No. 28, 1993 Oct. pp. 5561-5566.

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