Color filter substrate and method for fabricating the same

Details Color filter substrate and method for fabricating the same Color filter substrate and method for fabricating the same

2007-06-12

2007-06-12

McPherson, John A. (Department: 1756)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S110000, C349S156000, C430S007000

Reexamination Certificate

active

11031047

ABSTRACT:
A method of fabricating a color filter substrate includes forming a plurality of color filters on a substrate, wherein the color filters are spaced apart from each other by a first interval, and forming a common electrode on the substrate to cover the color filters. A photosensitive black material layer is formed on the common electrode to fill the first intervals between the color filters, and a mask is provided over the photosensitive black material layer. Light is then applied to the photosensitive black material layer from an upper side of the substrate through the mask and from a lower side of the substrate. The light-applied photosensitive black material layer is developed to form a plurality of black matrix portions within the first intervals between the color filters and to form a plurality of spacers above the color filters.

REFERENCES:
patent: 5418094 (1995-05-01), Sato et al.
patent: 5-303012 (1993-11-01), None
patent: 9-197120 (1997-07-01), None
patent: 11-014822 (1999-01-01), None
patent: 11-212075 (1999-08-01), None
patent: 2000-089214 (2000-03-01), None
patent: 2001-091727 (2004-04-01), None
Kazunori Hasebe et al., “Development of LCD Color Filter Production System ‘Transer’”, Fujifilm Research & Development (No. 44-1999), pp. 25-32.

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