Color filter manufacturing method using negative photoresist mat

Details Color filter manufacturing method using negative photoresist mat Color filter manufacturing method using negative photoresist mat

1991-04-01

1992-03-03

Miller, Stanley D.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359891, G02F 1133, G02B 522

Patent

active

050937383

ABSTRACT:
A method of forming a color filter substrate having pixels of at least two different colors by use of a negative photoresist material of the last color deposited. The negative photoresist is coated over the pixels and the exposed surface of the substrate. The back of the substrate is then exposed to a light source at a wavelength blocked by the formed pixels so that any of the negative photoresist material directly on the transparent substrate is activated by the light from the light source and remaining material is removed.

REFERENCES:
patent: 4610509 (1986-09-01), Sorimachi et al.
patent: 4808501 (1989-02-01), Chiulli
patent: 4948706 (1990-08-01), Sugihara et al.
patent: 5013138 (1991-05-01), Roosen et al.

Affiliated with

Also associated with

Rating

Color filter manufacturing method using negative photoresist mat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Color filter manufacturing method using negative photoresist mat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Color filter manufacturing method using negative photoresist mat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-276420