Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2007-07-10
2007-07-10
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S030000, C438S704000, C257SE21017, C257SE21218, C257S072000
Reexamination Certificate
active
11128160
ABSTRACT:
A method for manufacturing a color filter having a picture element part surrounded by a partition wall and provided in the plural number on a substrate including a step of forming the partition wall that has a lyophobic quality on the substrate, step of forming a lyophilic layer in the picture element part by applying a lyophilic liquid that develops the lyophobic quality to a substantially whole surface of the substrate on which the partition wall is formed all at once and a step of applying a droplet of colorant to the picture element part in which the lyophilic layer is formed.
REFERENCES:
patent: 5658697 (1997-08-01), Lin
patent: 5863233 (1999-01-01), Porter et al.
patent: 6120674 (2000-09-01), Porter et al.
patent: 6613486 (2003-09-01), Ohtsu et al.
patent: 7148148 (2006-12-01), Mori et al.
patent: A 2000-171628 (2000-06-01), None
patent: A 2000-187206 (2000-07-01), None
patent: A 2000-227513 (2000-08-01), None
patent: A 2000-258622 (2000-09-01), None
patent: A 2002-372921 (2002-12-01), None
Kawase Tomomi
Toyoda Naoyuki
Nhu David
Oliff & Berridg,e PLC
Seiko Epson Corporation
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