Color diffractive subtractive filter master recording comprising

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

350162SF, 427 43, G02B 518, G02B 2738

Patent

active

041556275

ABSTRACT:
Superposed fine-detail multi-level patterns (e.g., superposed diffraction gratings having specified line spacing dimensions less than 10 micrometers and specified depth dimensions less than 5 micrometers) can be fabricated by linearly adding (e.g., by evaporation) an additional two-level pattern to an existent multi-level pattern or, alternatively, by linearly subtracting (e.g., by sputter or plasma etching) an additional two-level pattern to an existent multi-level pattern.

REFERENCES:
patent: 2769111 (1956-10-01), Sadowsky
patent: 3771857 (1973-11-01), Thomasson et al.
patent: 3883232 (1975-05-01), Tsunoda
patent: 3911479 (1975-10-01), Sakurai
patent: 3957354 (1976-05-01), Knop
patent: 3981568 (1976-09-01), Bartolomei

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