Colloidal silica slurry for NiP plated disk polishing

Details Colloidal silica slurry for NiP plated disk polishing Colloidal silica slurry for NiP plated disk polishing

1997-11-06

2000-11-21

Koslow, C. Melissa

Abrasive tool making process, material, or composition

With inorganic material

Clay, silica, or silicate

51309, 216 89, B24B 2902

Patent

active

061496960

ABSTRACT:
A novel colloidal silica slurry including additives for enhancing the removal rate of a metallic workpiece, preventing etch pits, and enhancing smoothness. These additives include HNO.sub.3, H.sub.2 O.sub.2 and Al(NO.sub.3).sub.3. In lieu of colloidal silica, colloidal alumina can be used. The metallic workpiece can be NiP, Ni, Al or other appropriate materials.

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