Colloidal silica polishing abrasive

Details Colloidal silica polishing abrasive Colloidal silica polishing abrasive

1999-07-30

2000-12-12

Powell, William

Abrading

Abrading process

Utilizing fluent abradant

216 89, 252 791, 428404, 438690, 438693, 451 41, B24B 100, H01L 2100

Patent

active

061590770

ABSTRACT:
This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses in the finishing industry. The colloidal silica by product is referred to as "soot". Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal candidate for polishing applications. The soot has a large particle size when compared to conventional colloidal or fumed silica. As a result, the large size produces less surface damage and allows for a higher (faster) removal rate. The large particle size also results in super polished surfaces.

REFERENCES:
patent: 5266088 (1993-11-01), Sandusky et al.
patent: 5605490 (1997-02-01), Laffey et al.
patent: 5997620 (1999-12-01), Kodama et al.
patent: 6043159 (2000-03-01), Jacquinot et al.

Affiliated with

Also associated with

Rating

Colloidal silica polishing abrasive does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Colloidal silica polishing abrasive, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Colloidal silica polishing abrasive will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-211186