Colloid systems and wetting agents; subcombinations thereof; pro – Continuous or semicontinuous solid phase – The solid phase contains silica
Reexamination Certificate
2007-04-02
2010-06-08
Choi, Ling-Siu (Department: 1796)
Colloid systems and wetting agents; subcombinations thereof; pro
Continuous or semicontinuous solid phase
The solid phase contains silica
C427S397700
Reexamination Certificate
active
07732497
ABSTRACT:
A composition formulated to form a non-smooth surface on a substrate surface at least after the composition has been applied to the substrate and has substantially dried or set. The composition including a first and second set of colloidal particles. Each of the first and second sets of colloidal particles includes a plurality of colloidal particles. The first set of colloidal particles can have an average particle size that is greater than the average size of the second set of particles. The number of colloidal particles in the second set of colloidal particles can be greater than the number of colloidal particles in the first set of colloidal particles. One or more of the colloidal particles can be modified to include one or more hydrocarbon chains.
REFERENCES:
patent: 5204088 (1993-04-01), Noebel et al.
patent: 6478864 (2002-11-01), Field
patent: 6635735 (2003-10-01), Zhang et al.
patent: 6706798 (2004-03-01), Kobayashi et al.
patent: 6811856 (2004-11-01), Nun et al.
patent: 6852389 (2005-02-01), Nun et al.
patent: 6858284 (2005-02-01), Nun et al.
patent: 6997018 (2006-02-01), Sakoske et al.
patent: 7083828 (2006-08-01), Muller et al.
patent: 2002/0016433 (2002-02-01), Keller et al.
patent: 2002/0107316 (2002-08-01), Bice et al.
patent: 2002/0150723 (2002-10-01), Oles et al.
patent: 2002/0170690 (2002-11-01), Buchsel et al.
patent: 2003/0108716 (2003-06-01), Nun et al.
patent: 2003/0134035 (2003-07-01), Lamb et al.
patent: 2003/0147932 (2003-08-01), Nun et al.
patent: 2005/0103457 (2005-05-01), Nun et al.
patent: 2005/0113936 (2005-05-01), Brustad et al.
patent: 2005/0186872 (2005-08-01), Wang et al.
patent: 2005/0186873 (2005-08-01), Wang et al.
patent: 2005/0245633 (2005-11-01), Soutar et al.
patent: 2006/0110541 (2006-05-01), Russell et al.
patent: 2006/0147675 (2006-07-01), Nun et al.
patent: 2007/0009709 (2007-01-01), Krishnan et al.
patent: 2007/0249736 (2007-10-01), Watanabe et al.
patent: 0909747 (1999-04-01), None
patent: 0933388 (2002-10-01), None
patent: 0832947 (2003-05-01), None
patent: WO2004/037944 (2004-05-01), None
patent: WO 2004/090065 (2004-10-01), None
Gun'ko et al., “Mechanism and kinetics of hexamethyldisilazane reaction with a fumed silica surface, ”Journal of Colloid and Interface Science, vol. 288, pp. 157-170 (2000).
Cumberland Scott
Nguyen Danielle
Russell Jodi
Serobian Ashot
Choi Ling-Siu
Collins Erin
The Clorox Company
Wang Chun-Cheng
LandOfFree
Colloidal particles for lotus effect does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Colloidal particles for lotus effect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Colloidal particles for lotus effect will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4185480