Coldwall hollow-cathode plasma device for support of gas dischar

Details Coldwall hollow-cathode plasma device for support of gas dischar Coldwall hollow-cathode plasma device for support of gas dischar

1993-07-27

1995-10-10

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912143, 2191214, 156345, 20429837, B23K 1000, H01L 21306

Patent

active

054572983

ABSTRACT:
A hollow-cathode plasma device includes a hollow chamber composed of an electrically conductive material with a gas inlet at one end and a plasma outlet at an opposite end, a multipolar magnet array surrounding a portion of the chamber for isolating the plasma from the walls of the chamber, and a radiofrequency power source connected to the chamber.

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"Hollow Cathode Discharge Beams In Vacuum Processing" by John R. Morley; Trans. Vac. Met. Conf. 1963; American Vac. Soc.; pp. 186-202.
"High Rate Ion Production for Vacuum Deposition" by John R. Morley and Hugh R. Smith; reprinted from J. Vac. Sci. Technol., vol. 9, No. 6, Nov.-Dec. 1972.

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