Cold wax depilatory composition and related process

Bleaching and dyeing; fluid treatment and chemical modification – Treatment of hides – skins – feathers and animal tissues – Depilating

Reexamination Certificate

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C008S094160, C424S070100, C424S073000

Reexamination Certificate

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07867289

ABSTRACT:
A method of preparing a depilatory composition includes placing a quantity of sucrose into a heating vessel. Vinegar and citric acid are added into the heating vessel in the respective amounts of about 30 to 35% and 2.0 to 2.5% of the quantity of sucrose. The sucrose, vinegar and citric acid are stirred to create a mixture. The mixture is heated to about 230 degrees Fahrenheit. The mixture is diluted with water in an amount of 2.0 to 2.5% of the quantity of sucrose. The diluted mixture is cooled to form a soft was a room temperature once the temperature of the diluted mixture reaches about 230 degrees Fahrenheit.

REFERENCES:
patent: 3949067 (1976-04-01), Gibbs
patent: 4855131 (1989-08-01), Iris
patent: 5154919 (1992-10-01), Des Garets
patent: 5158765 (1992-10-01), Qasem
patent: 5698187 (1997-12-01), Naggiar
patent: 6074647 (2000-06-01), Zimmerman et al.
patent: 6517822 (2003-02-01), Buck
patent: 2001/0001660 (2001-05-01), Romero et al.
patent: 2004/0175340 (2004-09-01), Gupta
patent: 2004/0180014 (2004-09-01), Gupta
patent: 0649646 (1995-04-01), None

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