Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-11-10
1999-09-14
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118500, C23C 1600
Patent
active
059517743
ABSTRACT:
A vapor-phase growth system able to avoid fluctuation of the heating performance of a heater during repeated growth processes is provided. This system includes a reactor, a substrate holder for holding a substrate, and a heater for heating the substrate held by the holder. The holder and the heater are placed in an inner space of the reactor. The holder and the substrate held by the holder divide an inner space of the reactor to thereby form a growth chamber in which a thin film is grown during a growth process and a heater chamber in which the heater is placed. The holder has a supporting member on which the substrate is placed. At least a part of the member is made of the same material as that of the thin film. The supporting member is made of a SOI substrate.
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Aoyama Tohru
Shishiguchi Seiichi
Suzuki Tatsuya
Breneman Bruce
Lund Jeffrie R
NEC Corporation
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