Cold wall chemical vapor deposition apparatus with a heater...

Details Cold wall chemical vapor deposition apparatus with a heater... Cold wall chemical vapor deposition apparatus with a heater...

2005-02-22

2005-02-22

Mills, Gregory (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S725000

Reexamination Certificate

active

06857388

ABSTRACT:
A cold wall chemical vapor deposition apparatus includes: a chamber; a susceptor movable up and down in the chamber by a driving means, the susceptor including a heater and an internal electrode; a heat reflector over the susceptor, the heat reflector reflecting a heat emitted from the heater back to a wafer on the susceptor and serving as an correspondent electrode to the internal electrode; a heater control unit connected to the wafer, the heater and the driving means, the heater control unit sensing a temperature of the wafer, the susceptor moving according to the temperature; a gas supply unit supplying gases to the chamber; and a power source applying a voltage to the chamber.

REFERENCES:
patent: 4673588 (1987-06-01), Bringmann et al.
patent: 5350480 (1994-09-01), Gray
patent: 5372648 (1994-12-01), Yamamoto et al.
patent: 5376213 (1994-12-01), Ueda et al.
patent: 5688331 (1997-11-01), Aruga et al.
patent: 5778968 (1998-07-01), Hendrickson et al.
patent: 6110322 (2000-08-01), Teoh et al.
patent: 6135052 (2000-10-01), Fujii et al.
patent: 6328802 (2001-12-01), Miller et al.
patent: 11150073 (1999-02-01), None
patent: 19951878 (1995-01-01), None

Affiliated with

Also associated with

Rating

Cold wall chemical vapor deposition apparatus with a heater... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cold wall chemical vapor deposition apparatus with a heater..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cold wall chemical vapor deposition apparatus with a heater... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3497059