Cold trap vapor control device

Details Cold trap vapor control device Cold trap vapor control device

1989-05-22

1990-06-26

Woodard, Joye L.

Distillation: apparatus

Apparatus

Systems

159DIG42, 2021854, 202269, B01D 302, B01D 800

Patent

active

049369539

ABSTRACT:
A cold trap vapor control system for use in vapor control systems having a heat removal channel and a heat removal surface area arranged so that during operation a narrow or contoured path is formed for vapors therebetween such that condensation takes place in the path and condensate is thereby drained away from the trap, or utilized to improve vapor containment.

REFERENCES:
patent: Re31566 (1984-04-01), Langlitz et al.
patent: 31566 (1884-04-01), Langlitz et al.
patent: 36403 (1862-09-01), Grannis
patent: 78247 (1868-05-01), Berry et al.
patent: 349404 (1886-09-01), Sundstrom
patent: 460398 (1891-09-01), McGarvey
patent: 744367 (1903-11-01), De Lautreppe
patent: 798901 (1905-09-01), Hodges
patent: 911467 (1909-02-01), Blunden
patent: 1306687 (1919-06-01), Doubleday
patent: 1359276 (1920-11-01), Rushworth
patent: 1372865 (1921-03-01), Crane
patent: 1419894 (1922-06-01), Oliver
patent: 1511435 (1924-10-01), Yaten
patent: 1686418 (1928-10-01), Oliver
patent: 1812516 (1931-06-01), Dooley
patent: 2599451 (1952-06-01), Hickman et al.
patent: 3251397 (1966-05-01), Lens
patent: 3298929 (1967-01-01), Smith
patent: 3501381 (1970-03-01), Delano
patent: 3798902 (1974-03-01), Butter
patent: 3857679 (1974-12-01), Allred
patent: 3870605 (1975-03-01), Sakamoto
patent: 4089750 (1978-05-01), Kirschman et al.
patent: 4457805 (1984-07-01), Pastor
patent: 4687550 (1987-08-01), Wong

Affiliated with

Also associated with

Rating

Cold trap vapor control device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cold trap vapor control device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cold trap vapor control device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1123948