Cold plasma modification of organic and inorganic surfaces

Details Cold plasma modification of organic and inorganic surfaces Cold plasma modification of organic and inorganic surfaces

1977-12-12

1980-02-12

Esposito, Michael F.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204169, 204170, 427 41, 428422, B05D 306

Patent

active

041884264

ABSTRACT:
The surfaces of organic and inorganic substrates, such as polyethylene film and metals, respectively, can be modified by cold plasma deposition of difluorocarbene or trifluoromethyl radical specie generated by subjecting precursor vapor, for example, perfluorocyclobutane or hexafluoroethane, to a radio frequency electrical glow discharge.

REFERENCES:
patent: 3415683 (1968-12-01), Coffman et al.
patent: 3518108 (1970-06-01), Heiss, Jr. et al.
patent: 3663265 (1972-05-01), Lee et al.
patent: 3676350 (1972-07-01), Wright et al.
patent: 3776762 (1973-12-01), Bernath
patent: 3940506 (1976-02-01), Heinecke
patent: 4038439 (1977-07-01), Gibson et al.
IBM Technical Disclosure Bulletin, vol. 19, No. 4, Sep. 1976, p. 1400.

Affiliated with

Also associated with

Rating

Cold plasma modification of organic and inorganic surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cold plasma modification of organic and inorganic surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cold plasma modification of organic and inorganic surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1855299