Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1998-09-28
2000-10-10
Bettendorf, Justin P.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511191, 250423R, 25049221, H01J 2702
Patent
active
061305073
ABSTRACT:
The ion source of the invention emits ion beams radially inwardly or radially outwardly from the entire periphery of the closed-loop ion-emitting slit. In one embodiment, a tubular or oval-shaped hollow body, which also functions as a cathode, contains a similarly-shaped concentric anode spaced from the inner walls of the cathode at a distance required to form an ion-generating and accelerating space. The cathode has a continuous ion-emitting slit which is aligned with the position of the anode and is concentric thereto. A magnetic-field generation means is located inside the ring-shaped anode. When the ion source is energized by inducing an magnetic field, connecting the anode to a positive pole of the electric power supply unit, the cathode to a negative pole of the power supply unit, and supplying a working medium into the hollow housing, the electrons begin to drift in the annular space between the anode and cathode in the same direction in which the ions are emitted from the annular slit. By rearranging positions of magnet, anode, and cathode, it is possible to provide emission of ions in the inward or outward direction for treating outer or inner surfaces of tubular objects.
REFERENCES:
patent: 4122347 (1978-10-01), Kovlasky et al.
patent: 4710283 (1987-12-01), Singh et al.
patent: 6002208 (1999-12-01), Maishev et al.
Harold Kaufman, et al. Handbook of Ion Beam Processing Technology. (Edited by J. Cuomo, and S. Rossnagel). Noyes Publications, USA, pp. 8-20, 1989.
Maishev Yuri
Ritter James
Terentiev Yuri
Velikov Leonid
Advanced Ion Technology, Inc
Bettendorf Justin P.
Zborovsky I.
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