Cold antireflection layer deposition process

Details Cold antireflection layer deposition process Cold antireflection layer deposition process

2007-02-13

2007-02-13

Bashore, Alain L. (Department: 1762)

Coating processes

Optical element produced

C427S164000, C427S248100, C427S298000, C427S255230, C427S255280, C427S255395, C427S255390, C427S255700, C427S534000, C427S535000, C427S551000, C427S533000, C423S490000, C359S580000, C359S581000, C359S582000, C351S159000, C351S163000, C351S158000, C351S177000

Reexamination Certificate

active

10432662

ABSTRACT:
The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2(4, 4′), preparing the surface of the thus coated substrate, and depositing an outer MgF2layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

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