Coil device

Metal working – Method of mechanical manufacture – Electrical device making

Patent

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Details

29593, 29606, H01F 4106

Patent

active

055727883

ABSTRACT:
A method for adjusting inductance of a coil device of a closed structure wherein the coil device outside magnetic substance forming an endless loop, an inside magnetic substance formed inside of the outside magnetic substance and a coil wound on the periphery of the inside magnetic substance. The coil device further includes gaps between both ends of the outside magnetic substance and the inside magnetic substance, and notches or holes in the outside magnetic substance. In adjusting the inductance of the coil device, a jig is inserted through the notches or holes so as to shift the position of the inside magnetic substance with respect to the outside magnetic substance.

REFERENCES:
patent: 2130815 (1938-09-01), Riepka
patent: 2174355 (1939-09-01), Sundstrom
patent: 2413201 (1946-12-01), Tillman
patent: 2457806 (1949-01-01), Crippa
patent: 2494579 (1950-01-01), Pimlott et al.
patent: 2801293 (1957-07-01), Howell et al.
patent: 2946029 (1960-07-01), Abrams et al.
patent: 3078429 (1963-02-01), Wiesner
patent: 3197167 (1965-07-01), Sturgis
patent: 3209294 (1965-09-01), Cornell
patent: 3259861 (1966-07-01), Walker
patent: 3471815 (1969-10-01), Grant et al.
patent: 3480896 (1969-11-01), Neuman
patent: 3750069 (1973-07-01), Renskers
patent: 4377548 (1983-03-01), Pierpont
patent: 4558295 (1985-12-01), Olmsted et al.
patent: 4866409 (1989-09-01), Umezaki

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