Cobalt platinum magnetic film and method of fabrication thereof

Details Cobalt platinum magnetic film and method of fabrication thereof Cobalt platinum magnetic film and method of fabrication thereof

1994-05-05

1995-11-14

Kiliman, L.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

428336, 428611, 428664, 428665, 428666, 428667, 428668, 428670, 428694T, 428694TS, 428694SG, 428900, 428928, 2041821, 20418212, 20418215, 2041822, B32B 516, G11B 566

Patent

active

054665221

ABSTRACT:
A cobalt-platinum (CoPt) magnetic film is deposited onto a chromium (Cr) or tungsten (W) underlayer on a substrate, or is deposited directly onto the substrate and has an appreciable component of its C-axis which is parallel go the [00.2] direction, lying in the plane of the film whereby the resultant magnetic films exhibit coercivities from 2100-3000 oersteds.

REFERENCES:
patent: 4125446 (1978-11-01), Hartsough et al.
patent: 4353788 (1982-10-01), Jeffrey et al.
patent: 4587179 (1986-05-01), Nakamura
patent: 4596646 (1986-06-01), Kitada et al.
patent: 4756811 (1988-07-01), Takeoka et al.
patent: 4778582 (1988-10-01), Howard
patent: 4902583 (1990-02-01), Brucker et al.
patent: 4957604 (1990-09-01), Steininger
"Perpendicular Magnetic Anisotrophy of Tb-Co Amorphous Films Sputtered in H.sub.2 -Added Ar Gas", Niihara et al., Appl. Phys. Lett., vol. 45, No. 8, pp. 872-874.
IEEE Transactions of Magnetics, vol. 28, No. 5, Sep. 1990, pp. 2409-2411, N. Smith et al.
Patent Abstracts of Japan, vol. 15, No. 387 (E-1117) 30 Sep. 1991 & JP-A-03-155 606 (Toshiba Corp.) 3 Jul. 1991.

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