Cobalt imprinted polymer composition for selective removal...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

Reexamination Certificate

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C526S303100, C526S317100, C526S310000, C526S227000

Reexamination Certificate

active

07001963

ABSTRACT:
The present invention provides a polymer composition for the selective removal of cobalt, a process for the preparation thereof and the process for removal of cobalt, using the said polymer composition. More particularly it relates to a cross-linked polymer composition prepared by the molecular imprinting technique. The preparation of the cross linked polymer involves selection of vinyl monomers bearing functional groups that bind to cobalt, formation of a complex of these monomers with cobalt and subsequent polymerization of the complex in presence of a crosslinker. The process for the removal of cobalt comprises treating the solution containing a mixture of cobalt and other metal ions with the polymer under conditions sufficient for cobalt to form a complex with the polymer and separating the polymer from the cobalt depleted solution.

REFERENCES:
patent: 5780578 (1998-07-01), Mashelkar et al.
Kuchen et al., “Metal-Ion Selective Resins by Matrix Imprint with Methacrylates”, Angew. Chem. Int. Ed., vol. 27, No. 12, 1988, pp. 1695-1697, XP002295591.

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