Coaxial plasma arc vapor deposition apparatus and method

Details Coaxial plasma arc vapor deposition apparatus and method Coaxial plasma arc vapor deposition apparatus and method

2005-11-07

2011-10-18

Hendricks, Keith D (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298210

Reexamination Certificate

active

08038858

ABSTRACT:
An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.

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