Coaxial cavity type, radiofrequency wave, plasma generating appa

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source

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315 39, 31511141, 3133621, 250423R, 118 501, 427 38, H01J 724, H05B 3126

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049069004

ABSTRACT:
A coaxial radiofrequency wave plasma generating apparatus with an elongate metallic cavity (10) having a movable elongate coupling probe (16) mounted in line with an axis (a--a) of the cavity having a central coaxial conductor (11) and having a movable plate (12) for obtaining a mode of resonance of the radiofrequency wave in the cavity surrounding a chamber (14) for confining the plasma (100) is described. An end (11b) of the conductor is adjacent to the chamber and can optionally support a set of magnets (27). The apparatus is particularly useful for retrofitting existing vacumm sources (101) having small inlet ports (105) for plasma treatment using molecular beam epitaxy (MBE).

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