Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1989-04-30
1990-03-06
Laroche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
315 39, 31511141, 3133621, 250423R, 118 501, 427 38, H01J 724, H05B 3126
Patent
active
049069004
ABSTRACT:
A coaxial radiofrequency wave plasma generating apparatus with an elongate metallic cavity (10) having a movable elongate coupling probe (16) mounted in line with an axis (a--a) of the cavity having a central coaxial conductor (11) and having a movable plate (12) for obtaining a mode of resonance of the radiofrequency wave in the cavity surrounding a chamber (14) for confining the plasma (100) is described. An end (11b) of the conductor is adjacent to the chamber and can optionally support a set of magnets (27). The apparatus is particularly useful for retrofitting existing vacumm sources (101) having small inlet ports (105) for plasma treatment using molecular beam epitaxy (MBE).
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Board of Trustees operating Michigan State University
Ham Seung
LaRoche Eugene R.
McLeod Ian C.
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