Coating treatment method and coating treatment apparatus

Details Coating treatment method and coating treatment apparatus Coating treatment method and coating treatment apparatus

2005-09-13

2010-11-16

Tadesse, Yewebdar T (Department: 1713)

Coating apparatus

With means to apply electrical and/or radiant energy to work...

Radiant heating

C118S642000, C118S323000, C118S321000, C118S313000, C118S058000

Reexamination Certificate

active

07832352

ABSTRACT:
To perform a series of resist coating treatments from application of a resist solution to removal of a resist film on a wafer edge portion in a shorter time.A laser irradiation unit for applying a laser light is provided in a resist coating unit. At the time of resist coating treatment, the resist solution is discharged onto a central portion of the rotated wafer from a resist solution supply nozzle to form a resist film on the wafer. Thereafter, the laser irradiation unit moves to an outer peripheral portion of the wafer and applies the laser light onto the resist film on the outer peripheral portion to dry the resist film on the outer peripheral portion. After the resist film on the outer peripheral portion dries, the application of laser light is continued, and the solvent supply nozzle moves to a position above the edge portion of the wafer and supplies the solvent to the resist film on the edge portion of the wafer. The supply of the solvent dissolves and removes the resist film on the edge portion of the wafer.

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