Coating station

Details Coating station Coating station

1996-04-01

1999-06-15

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429823, 20429815, C23C 1434

Patent

active

059118610

ABSTRACT:
A coating station has a flat sputter source opposite a workpiece receiving arrangement is configured as a planet arrangement. The rotating axes (A.sub.p) of the planets intersect one another on a rotating axis (A.sub.s) of the sun system on the side facing away from the sputter source. As a result, substrates, particularly optical lenses, can be coated in extremely small batches according to given formulas in an advantageously flexible manner.

REFERENCES:
patent: 5074246 (1991-12-01), Gailliard et al.
patent: 5525199 (1996-06-01), Scobey

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