Coating solution of polyetherimide-forming monomers in a solvent

Details Coating solution of polyetherimide-forming monomers in a solvent Coating solution of polyetherimide-forming monomers in a solvent

1978-11-13

1981-03-10

Schofer, Joseph L.

Coating processes

With post-treatment of coating or coating material

Heating or drying

260 292N, 260 292M, 260 302, 260 308DS, 260 314R, 260 326N, 260 332R, 260 334R, 260 342, 427120, 428379, 428395, 428411, 4284735, 525 20, 525 26, 525172, 525183, 525185, 525188, 525208, 525353, C08G 6902, C08G 6926, C08K 506, B05D 512

Patent

active

042554713

ABSTRACT:
Disclosed is a solution including an aromatic bis (ether dicarboxylic acid) component, an organic diamine component and a solvent system including a water-soluble organic solvent component, which may be a dipolar aprotic solvent or a monoalkyl ether of ethylene glycol or of diethylene glycol, and optionally water. The solution may be coated on a substrate and polymerized to form high quality polyetherimide coatings.

REFERENCES:
patent: 3440197 (1969-04-01), Boldebuck et al.
patent: 3518219 (1970-06-01), Lavin et al.
patent: 3563951 (1971-02-01), Radlmann et al.
patent: 3905942 (1975-09-01), Takekoshi et al.
patent: 3968083 (1976-07-01), Quinn
patent: 4020069 (1977-04-01), Johnson et al.
patent: 4115341 (1978-09-01), Boldebuck et al.
patent: 4119605 (1978-10-01), Keating
patent: 4119608 (1978-10-01), Keating
patent: 4170684 (1979-10-01), Schmidt et al.
patent: 4181641 (1980-01-01), Boldebuck et al.
Advances in Chemistry vol 84 pp. 1-11 (1967) Assarsson et al.

Affiliated with

Also associated with

Rating

Coating solution of polyetherimide-forming monomers in a solvent does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating solution of polyetherimide-forming monomers in a solvent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating solution of polyetherimide-forming monomers in a solvent will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1294478