Coating solution for forming silica film

Compositions: coating or plastic – Coating or plastic compositions – Silicon containing other than solely as silicon dioxide or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S780000, C438S790000

Reexamination Certificate

active

07153355

ABSTRACT:
To provide a silica film-forming material having a low dielectric constant and giving a film of less undergoing change in aging, a coating solution for forming a silica film includes a hydrolysis product of a mixture comprising: a tetraalkoxysilane; and at least one of a monoalkyltrialkoxysilane and a dialkyldialkoxysilane, and an ammonium salt represented by formula (I):wherein R1represents an alkyl group having from 6 to 30 carbon atoms, R2represents an alkyl group having from 1 to 5 carbon atoms, and X represents CH3COO, SO3H or OH.

REFERENCES:
patent: 6214104 (2001-04-01), Iida et al.
patent: 6471761 (2002-10-01), Fan et al.
patent: 6576568 (2003-06-01), Mandal et al.
patent: 6896955 (2005-05-01), Mandal et al.
patent: 2002/0020327 (2002-02-01), Hayashi et al.
patent: 2002/0042210 (2002-04-01), Mandal et al.
patent: 2002/0086166 (2002-07-01), Hendricks et al.
patent: 2006/0009575 (2006-01-01), Nakashima
patent: 6-263435 (1994-09-01), None
patent: 200226003 (2002-01-01), None
patent: 2004161875 (2004-06-01), None
Takamaro Kikkawa et al., Nikkei Microdevices, Feb. 2003 p. 123-132.
Taiwanese Office Action issued Jul. 27, 2006 (w/English Translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating solution for forming silica film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating solution for forming silica film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating solution for forming silica film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3702061

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.