Coating solution for forming high dielectric constant thin...

Details Coating solution for forming high dielectric constant thin... Coating solution for forming high dielectric constant thin...

2011-02-15

2011-02-15

Brunsman, David M (Department: 1732)

Coating processes

Electrical product produced

Metallic compound coating

C427S080000, C427S240000

Reexamination Certificate

active

07887879

ABSTRACT:
Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a β-diketone or its derivative, and a benzoic acid derivative having an electron donating group. The method comprises spin coating the coating solution on a substrate to form a thin film and drying the thin film at a low temperature to crystallize the thin film. The titanium-containing coating solution is highly stable. In addition, the coating solution enables formation of a thin film, regardless of the kind of substrates, and can be used to form dielectric thin films in an in-line mode in the production processes of PCBs.

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Japanese Office Action, with English translation, issued in Japanese Patent Application No. 2006-272931, mailed Mar. 2, 2010.
United States Office Action issued in U.S. Appl. No. 12/437,657 dated Mar. 31, 2010.
United States Office Action issued in U.S. Appl. No. 12/437,657, dated Jul. 9, 2010.

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